Volume 15, No. 5, October 2015, Pages 1787-1798 PDF(3.29 MB)
Particles and Metallic Elements near a High-Tech Industrial Park: Analysis of Size Distributions
Wei-Yea Chen, Ho-Wen Chen, Cheng-Nan Chang, Yu-Hao Lin, Yen-Hsun Chuang, Yu-Chi Lin
Department of Environmental Science and Engineering, Tunghai University, No.181, Sec. 3, Taichung Port Rd., Xitun Dist., Taichung City 407, Taiwan
- High-tech industry is one contributor of ultrafine particles, especially in central Taiwan.
- Serious emit of Ga, As and Cd from High-tech industrial park was observed by size distribution analysis.
- The proposed expected value model identifies the pollution source of ultrafine particles rapidly.
To characterize airborne particles near high-tech industrial parks, this case study used an eight-stage micro-orifice uniform deposit impactor sampler to analyze trace metal patterns in different size groups of airborne particles at the Central Taiwan Science Park (CTSP) in Taichung. To rapidly screen out the potential pollution sources according to the analytical results, a novel model based on expected value theory is proposed. The analytical results show that the ambient air near the CTSP is rich in fine and ultrafine particles and V, As, Ga and Cd have significant increases in ultrafine particles between upwind and downwind areas of CTSP. The proposed source screening tool indicates that CTSP is the major contributor to airborne concentrations of Ga and As in the ambient air near the CTSP, especially in fine and ultrafine particles.
High-tech industry; Central Taiwan Science Park; Trace metal; Ultrafine particles; Rapid pollution sources screening model.